Advances in EELS Instrumentation C.T. Koch Stuttgart Center for Electron Microscopy Max Planck Institute for Metals Research Stuttgart, Germany ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Outline • • • • • 2 How to sort electrons by energy Spectroscopy & monochromation Spatially resolved spectroscopy Momentum resolved spectroscopy Energy filtering ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 1 How to disperse Electrons (i.e sort them by energy) 3 C.T. Koch, MPI for Metals Research ESTEEM Winter Workshop 2009 Lorentz Force Sorts Electrons by Color FLorentz e E v B FLorentz => a Lorentz melectron FLorentz L2 x => 2melectron v 2 polychromatic electron beam FLorentz L fast => Electrostatic or magnetic fields or the combination of both may be used to construct a spectrometer. 4 ESTEEM Winter Workshop 2009 slow x spectrum C.T. Koch, MPI for Metals Research 2 Velocity of Beam Electrons C ARM1250 200 kV 0 5 ESTEEM Winter Workshop 2009 300 kV C.T. Koch, MPI for Metals Research Curved Magnetic Prism Slower electrons experience a stronger deflection by the magnetic field. The momentum p of the electron may then be determined from the radius of curvature R: Focal plane of projector lens system e p B R, c p2 E 2 m Slow electrons of energy E2 < E1 Magnetic Prism Energy Dispersive Plane B X Fast electrons of energy E1 Remember, classically: xdetector ~ p-2 = 1/(2mE) => for small E x ~ -E 6 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 3 Practical Design of Magnetic Prism (a.k.a. “drift tube”) Soft-magnetic “mirror plates” (reduce fringing fields) A corrected spectrometer: • The path length does not depend on the position within the entrance aperture anymore. • Fringing fields are minimized by mirror plates • Possibility to make spectrum truly linear (?) 7 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Curved Electrostatic Prism In first FEG-STEM (1968) A.V. Crewe et al, J. Appl. Phys. 39, (1968) 5861 - 5867 8 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 4 Principle of Wien Filter Wien condition: FLorentz e E v B 0 for E v B By combining electrostatic and magnetic field electrons of the desired energy can be kept on a straight path. Figure from: W. Grogger et al. Top Catal (2008) 50:200–207 9 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Spectroscopy 10 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 5 Motivation for Improving EELS Resolution Potential applications for transmission EELS instrumentation with improved energy resolution: • Band gap and dielectric function mapping of novel semiconductor structures • Dielectric function mapping of nanostructures (e.g. fast identification if carbon nanotube chirality) • Phonon spectroscopy of nanostructures (e.g. QD-Laser, QD-Logic / Quantum Computers, Energy dissipation in single electron transistors, etc. …) • Competition with optical spectroscopy, but: better spatial and momentum resolution! • Improved ELNES resolution in some materials and edges (only a few) 11 C.T. Koch, MPI for Metals Research ESTEEM Winter Workshop 2009 Energy Resolution in Spectroscopy PSFSpectrum = PSFHV-spread x PSFSource x PSFSpectrometer x PSFDetector Detector: high spectrum magnification Spectrometer: high dispersion, high stability Shottky-FEG: E = 0.5 .. 0.8 eV Cold-FEG: E = 0.25 .. 0.5 eV Carbon Nanotube: E = 0.05 .. 0.2 eV Monochromator: E = 0.002 .. 0.2 eV Very stable high voltage (ppm stability (10-6) => E = 0.2 eV @ 200kV) Deconvolution of PSF only possible if: • excellent signal / noise properties • PSFSpectrum is known precisely (e.g. shape of ZLP) => Improvement of resolution by factor 3 has been shown to be possible 12 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 6 Serial Acquisition Spectrometer (SEELS) The spectrum is scanned across a slit aperture, only one energy recorded at a time 13 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Crewe’s Curved Electrostatic Prism Electrostatic serial spectrometer In first FEG-STEM (1968) A.V. Crewe et al, J. Appl. Phys. 39, (1968) 5861 - 5867 14 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 7 Parallel Spectrum Acquisition (PEELS) Gatan “666” PEELS Gatan “Enfina” Spectrum illuminates a diode or CCD array => whole spectrum recorded at once 15 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Non-commercial TEELS Instruments • Boersch and Geiger (1964): MC + Spectrometer dE = 17 meV, dx = 10 µm, E0 = 25 kV (1964) (1972) dE = 4meV, dx = 10 µm, E0 = 25 kV • Batson (1986): cold FEG + Spectrometer [res.: 50 meV] dE = 250 meV, dx = 1 nm, E0 = 100 kV • Fink (1989): dE = 80 meV, dx = 1mm, E0 = 170 kV • Terauchi (1999): couple MC + Spectrometer dE = 25 meV, dx = 110 nm, E0 = 200 kV, Emax <= 5 V dE = 200 meV, dx = 110 nm, E0 = 200 kV, Emax = 300 V H. Boersch et al. Phys. Letters 3, (1962) 64 R. F. Batson, Rev. Sci. Instrum. 57, (1986) 43–48. J. Fink, Adv. Elec. & Elec. Phys. 75, (1989), 121–232. M. Terauchi et al, Journal of Microscopy 194, (1999), 203–209 16 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 8 Wien Filter Instruments Highest (transmission) EELS Resolution has so far been achieved by instruments using a Wien Filter as a monochromator and spectrum analyzer: • Boersch et al (1964): FWHM(ZLP) = 2 meV (25kV) • Terauchi et al (1999): FWHM(ZLP) = 12 meV (200kV) 17 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Wien Filter – type Monochromator Monochromatization of fast electrons in a Wien-type filter monochromator (a); dispersed electron beam on the viewing screen of the TEM before (b) and after (c) introduction of the energy-selecting slit Figure from: W. Grogger et al. Top Catal (2008) 50:200–207 18 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 9 Fringe Field Monochromator MC on (61 meV) Cold FEG Test on a VG HB501 at IBM Watson Research center H.W. Mook and P. Kruit, Ultramicroscopy 81 (2000) 129 -139 19 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Improvement by Monochromation dE = 700 meV (w/o MC) dE = 100 meV (w/ MC) dE = 40 meV (w/ MC) EEL Spectra of Argon recorded at different energy resolutions Incident beam energy: E0 = 25 keV (transmission EELS) Peak interpretation H. Boersch, J. Geiger and W. Stickel, Zeit. Physik. 180 (1964), 415–424 20 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 10 Boersch’s Instrument 25 kV Deceleration Acceleration Slowing down electrons increases dispersion of Wien filter E = 17 meV H. Boersch, J. Geiger and W. Stickel, Zeit. Physik. 180 (1964), 415–424 21 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Phonon Spectroscopy in TEELS 0.1 mrad Energy Resolution: 4 meV (2meV w/o specimen) B. Schröder and J. Geiger, Phys. Rev. Lett. 28 (1972), 301 - 303 22 ESTEEM Winter Workshop 2009 Low spatial resolution C.T. Koch, MPI for Metals Research 11 170 kV Spectrometer with E=80 meV -170 kV ground electrostatic analyzer electrostatic monochromator Advantage: • slow high voltage fluctuations have no effect, because they cancel during deceleration. • variable energy resolution • momentum resolution: 1 mrad 23 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Terauchi’s Approach Deceleration of electrons inside MC and Spectrometer to potential U0 Dispersion of MC = Dispersion of Spectrometer Energy resolution increases with decreasing U0 Poor energy resolution @ high energy loss M. Terauchi et al, Journal of Microscopy,194, (1999) 203 24 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 12 Wien Filter designs EZLP = 81 meV @ E0 = 40V EZLP = 15 meV @ E0 = 20V EZLP = 12 meV @ E0 = 15V K. Tsuno, Rev. Sci. Instrum. 64 (1993) 659–666. [Wien condition also in fringing field] 25 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Spectrometer Aberrations Diffraction pattern Image Spectrometer aberrations • Reduce spectral resolution (by convoluting diffraction pattern or image with the spectrum) • Reduce the area that can be imaged (depends on width of energy-selecting slit). Energy Dispersive Plane (Spectrum x Image) Magnetic Prism B X Energy-slit 26 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 13 Effect of Spectrometer Aberrations Without specimen: E = 12 meV With specimen: E = 25 meV M. Terauchi et al, Journal of Microscopy,194, (1999) 203 27 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research A STEM-capable Spectrometer • Spectrometer capable of E = 50 meV • No Monochromator, but a cold-FEG => E = 250 meV • E0 = 120 kV • Can handle acceptance semi-angles used in STEM spectroscopy E = 70 meV at = 12.5 mrad P. E. Batson, Rev. Sci. Instrum. 57 (1986) 43–48. 28 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 14 Improvements of Core-loss EELS by MC Microscope: Tecnai F20 + MC (Graz) – Al2O3 MC = on MC = off first to show spin-orbit coupling in – Al2O3 by EELS W. Grogger and G. Kothleitner, Top. Catal. 50 (2008), 200–207 29 D.S. Su, G. Kothleitner, et al Ultramicroscopy (2003) ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Improvements of Core-loss EELS by MC Co L2,3 edge from CoO recorded with the Tecnai F20 (200 kV, Schottky emitter, background subtracted), without monochromator (0.65 eV) and with monochromator (~0.20 eV) W. Grogger et al. Top Catal (2008) 50:200–207 30 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 15 MC makes weak features visible Calcite (CaCO3) Ca-L2,3 edge Aragonite (CaCO3) Ca-L2,3 edge Data recorded by V. Srot at Zeiss SESAM (StEM) with 0.2 eV energy resolution 31 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Energy Resolution Limits MC useful Natural width of K and L versus edge energy Final-state energy broadening as a function of energy above the ionization threshold R. Egerton, Micron 34 (2003) 127–139 32 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 16 Phonon Spectroscopy in TEELS 0.1 mrad Energy Resolution: 4 meV (2meV w/o specimen) B. Schröder and J. Geiger, Phys. Rev. Lett. 28 (1972), 301 - 303 33 ESTEEM Winter Workshop 2009 Low spatial resolution C.T. Koch, MPI for Metals Research Current Monochromator Designs (has residual dispersion) (has residual dispersion) (dispersion free) electrostatic 34 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 17 Design of the CEOS Monochromator Gun Lens Emitter Assembly MC Slit MC Slit Selector • High Dispersion (12µm / eV @ 4.3 kV extractor potential) • No dispersion behind MC ! (No rainbow illumination) • Spot Size is preserved by the Monochromator full analytical capabilities, no effect on resolution in STEM • Ease-of-use: - Simple slit selection (electrical or piezo driven) - Simple switch to unmonochromated beam (straight beam path) 35 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Performance of Electrostatic MC 0.5 µm slit ZLP compared to unfiltered ZLP MC slit removed MC slit inserted 48 meV MC slit Zero-loss peak (ZLP) recorded on Zeiss SESAM (StEM), E0 = 200 kV => Almost no reduction of intensity by MC Slide courtesy E. Essers 36 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 18 Spot size with and without monochromator Slide courtesy E. Essers MC off dFWHM 0,47nm MC on dFWHM 0,5nm Monochromator does not affect the probe size Zero-loss peak (ZLP) recorded on Zeiss SESAM (StEM), E0 = 200 kV 37 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 48 meV ZLP @ 0.5 s exposure time Slide courtesy E. Essers 48 meV High Energy Resolution Zero-loss peak (ZLP) recorded on Zeiss SESAM (StEM), E0 = 200 kV Size of Filter entrance aperture: 50 µm 38 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 19 87 meV ZLP @ 100 s exposure time! Slide courtesy E. Essers 87 meV Excellent energy resolution also for low-intensity features! Size of Filter entrance aperture: 50 µm 39 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Sum of 30 aligned ZLP: 43 meV @ 0.1 s Slide courtesy E. Essers 43 meV Spectra recorded and automatically aligned by custom DM script Size of Filter entrance aperture: 50 µm 40 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 20 52 meV ZLP @ 0.1 s with large aperture Slide courtesy E. Essers Size of Filter entrance aperture: 0.4 mm 100 90 80 70 x 10^4 60 52 meV 50 40 30 20 10 0 -0.08 -0.06 -0.04 -0.02 0.00 eV 0.02 0.04 0.06 0.08 High energy resolution even for large filter entrance apertures => lots of current in spectrum 41 C.T. Koch, MPI for Metals Research ESTEEM Winter Workshop 2009 Steep drop of the ZLP (0.1 s, large aperture) Slide courtesy E. Essers 1x10 6 10-1 @ E = 0.048 eV 2x10 5 1x10 5 10- 2 @ E = 0.091 eV 2x10 4 1x10 4 10- 3 @ E = 0.260 eV 2000 1000 10- 4 @ E = 0.570 eV 200 100 20 10 0 0.00 0.05 0.10 0.15 0.20 0.25 0.30 0.35 0.40 0.45 0.50 0.55 eV 0.60 0.65 0.70 0.75 0.80 0.85 0.90 0.95 1.00 1.05 1.10 Sharp drop of ZLP tail => Good conditions to measure weak spectral features and low-loss EELS 42 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 21 Wien Filter Monochromator Comparison of the zero-loss peaks of an unfiltered Schottky field emission microscope (200 kV) and the monochromated electron beam of the Tecnai F20 (Graz). • Wien-filter type monochromator in accelerating mode • Exposure time = 1 s W. Grogger et al. Top Catal 50 (2008) 200–207 43 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research HR-EELS of Surfaces H. Ibach, PRL 24 (1970) 1416 ELS5000 (LK Technologies) E >= 0.5 meV 44 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 22 Energy Filtering 45 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research What are Imaging Energy Filters good for? • EEL Spectrum (you don‘t really need an energy filter for this, a plain spectrometer will do) • Energy Filtered Electron Diffraction (EFED) • Energy Filtered TEM (EFTEM) • Spectrum profiling (STRIPE-TEM) • EEL-dispersion curves (momentum-resolved EELS) 46 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 23 Zero-Loss Filtering in Electron Diffraction Convergent beam electron diffraction (CBED) patterns become much clearer, if the diffuse inelastic scattering background has been removed by zero-loss energy filtering. Figure from: M. Tanaka et al, Journal of Microscopy, 194, (1999), 219–227 47 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Energy-Filtered Diffraction Patterns unfiltered Position of line scan in following slide Unfiltered CBED Pattern of Si (110) [120kV, Zeiss EM912 @ ASU] 48 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 24 ZL-Filtering Removes Diffuse Inelastic Background Holz-ring unfiltered zero-loss filtered Linescans across diffraction pattern along the direction indicated by the red shaded area in previous slide. The inelastic diffuse background increases with specimen thickness. Inset: Central part of zero-loss filtered CBED pattern. 49 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Linescans across interfaces position Sequentially acquired EELS Linescan across an interface in a Si3N4 ceramic (Si L edge) intensity Energy-loss Data: K. van Benthem [VG501 @ StEM] 50 ESTEEM Winter Workshop 2009 Energy-loss C.T. Koch, MPI for Metals Research 25 Electron Spectroscopic Profiling (ELSP) Single focusing spectrometers preserve spatial information in the dirtection normal to the dispersive direction. E=0 AlGaAs GaAs • Less beam damage • Better Signal/Noise energy interface 50nm Data: Lin Gu on Zeiss Libra 200 (StEM), equipped with corrected Omega filter 51 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Electron Spectroscopic Profiling (ELSP) Concentration profiles across an interface from a single exposure! (La,Ca)MnO3/SrTiO3 – 3.9A resolution Spectrum profile recorded with a single CCD exposure using a Gatan Imaging Filter (GIF) T. Walther, Ultramicr. 96, 401 (2003) 52 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 26 Momentum-Resolved EELS Zero Loss Peak (ZLP 3.3eV band edge interband transitions Diagram: P. Midgley, Ultram. 76 (1999), 91 5eV volume plasmon 50μrad 53 Data: Lin Gu on Zeiss Libra 200 (StEM), equipped with corrected Omega filter ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Physical Resolution Limits • Energy Resolution: limited by inv. lifetime of – The final state (1/Tf) – The initial state (1/Ti) [the core hole] => Both increase with energy • Spatial resolution (Heisenberg’s uncertainty principle): p·x ≈ h => x 54 h 2 0 .8 / ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 27 Spatial Resolution Limits Calculated values of localization distance, as a function energy loss. R. Egerton, Micron 34 (2003) 127–139 55 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Data: Lin Gu, MPI-MF Microscope: Zeiss Libra 200FE+MC Delocalization of Inelastic Scattering Spatial-resolution of inelastic scattering (neglecting aberrations) using an AlGaN edge (effective CCD pixel size: 2Å). d50 experimental reflects an average value with energy-slit of about 2eV. 56 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 28 Energy Filtering Instrumentation 57 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Energy Filtering Instrumentation • Electrostatic mirror + magnetic prism – Henry-Castaing filter • Magnetic Prism(s) – Omega filter – MANDOLINE filter – Gatan Imaging Filter (GIF) 58 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 29 Energy Filters While dispersing electrons energy filters preserve their spatial distribution in the filter entrance plane, allowing partial images produced by electrons of a certain energy to be selected. 59 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Castaing-Henry-Ottensmeyer-Filter sample 1st projector lens system Electrostatic mirror Mirror must decelerate electrons to v = 0 => difficult to implement at higher voltages. 2nd projector lens system Magnetic prism Commercial implementation in the Zeiss EM 902A Max. acc. voltage: E0 = 80 kV 60 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 30 Imaging Energy Filters Intermediate Diffraction Pattern Intermediate Image Imaging Energy Filter An optical which replicates the image in O1 in O3, but electrons of different energy cross the image plane O3 at different angles of incidence. Achromatic image D: diffraction plane O: image plane S: sextupole lens Energy dispersed diffraction pattern Energy-selecting slit aperture 61 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Zeiss Omega Filter In EFTEM mode, the energy filter is used to record images formed by electrons that have experienced different energy losses. The energy window is shifted by changing the accelerating voltage of the microscope. This ensures that the TEM optics may remain unchanged. 62 Slit aperture C1 .. C7: correction elements ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 31 JEOL Omega Filter (200kV) Omega Filter fitted to a JEM-2010F (200kV) Slit width: 16 eV Cs = 0.5 mm E0 = 100 kV M. Tanaka et al, Journal of Microscopy 194, (1999), 219–227. 63 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research MANDOLINE-Filter Schematic arrangement of the deflection elements and the sextupoles within the MANDOLINE filter, the distance between the energy selection plane and the diffraction image in front of the filter defines the lengthening of the column. MANDOLINE filter: Magnetic Aberration-free Noticeably Dispersive Omega-Like INhomogeneous Energy filter S. Uhlemann and H. Rose, Optik 96 (1994) 163 - 178 H. Rose, Sci. Technol. Adv. Mater. 9 (2008) 014107 64 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 32 Diagram: G. Botton Post Column Filter: GIF 65 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Actual Design of a Post-Column Filter Gatan Imaging Filter (GIF): mounted below the column 66 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 33 In-Column vs. Post-Column In-Column (Omega) Filter • 4 Dispersive elements (4x90°) • Symmetry cancels some aberrations • Integrated into microscope column • Electron Optics designed to optimize filter performance • Spectra and images projected on viewing screen, image plate, photographic film, TV-camera, CCD, … 67 Post-Column Filter • 1 dispersive element (90°) • No axis of symmetry • May be added to any existing microscope • Filter- and microscope optics separately controlled • Only detectors integrated into energy filter possible (no film, no viewing screen, no image plate, …) ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research S. Uhlemann and H. Rose, Optik 96 (1994) 163 - 178 Energy filters (as of 1994) ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 34 Energy Filter Aberrations Diffraction pattern Image Imaging energy filter aberrations • Reduce spectral resolution (by convoluting diffraction pattern or image with the spectrum) • Reduce the area that can be imaged (depends on width of energy-selecting slit). Energy Dispersive Plane (Spectrum x Image) Magnetic Prism Energy varies across diffr. pattern (non-isochromatic) B X Energy-slit 69 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Energy-filtered Electron Diffraction Energy-filtered CBED pattern (Slit width: 10eV) Energy variation for CBED pattern (Energy loss: 0eV [red] .. 10eV [blue]) (M.M.G. Barfels, M. Kundmann, C. Trevor, J.A. Hunt, Microsc Microanal 11(Suppl 2), 2005) 70 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 35 Transmissivity: an energy filter’s Q-factor An energy filter’s transmissivity reflects the ability of the system to image a certain field of view (2r2) with a given spatial resolution (max scattering angle ) through an energy slit of width E. TE 2r 2 2 Assuming that the objective aperture acceptance angle is matched to the pixel size of the detector the desirable transmissivity depends only on the number of detector pixels N along one side of a square detector: TE N 2 71 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Effect of Transmissivity on Diffraction Patterns unfiltered filtered Zero-loss Plasmon-loss The transmissivity of an energy filter is the product of area and solid angle that can be transmitted at a certain energy slit width. Si (110) recorded in a Zeiss EM912 with an (uncorrected) Omega filter E0 = 120 kV, slit width = 10 eV 72 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 36 Non-Isochromaticity Energy Filter Filter slit width E Energy slit limits field of view 73 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Comparison of non – Isochromaticity HR-GIF: 2210 meV (p-p) (polar coordinates) G. Kothleitner et al, Micron 34 (2003) 211–218 74 SESAM: 7 meV (peak to peak) (cartesian coordiantes) C.T. Koch et al, Microsc. Microanal. 12 (2006) 506–514 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 37 Post-Filter Magnification Helps In column filters have the advantage of being able to optimize the pre-and post-filter magnification w.r.t the overall performance of the microscope and filter. Non-isochromaticity of the JEOL 200kV in-column energy filter K. Tsuno, Journal of Electron Microscopy 47 (1998) 611-619 75 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Effect of non-Isochromaticity 100 nm 23 eV 22 eV SiC Si3N4 Image: A. Zern, W. Sigle Libra 200 @ MPI-MF Map of Plasmon energies in a Si3N4 / SiC ceramic determined by fitting the position of the plasmon peak energy to an EFTEM series. The different plasmon energies stem from different valence electron densities in these materials. The shift in plasmon energy from left to right is due to an non-isochromaticity of 0.5eV. 76 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 38 Evolution of In-Column Filter Designs 120kV 23eV 15eV 12nm2 1eV, 80kV 9nm2 1eV, 120kV 1984 77 0.5eV 0.007eV 190nm2 1eV, 200kV 11000nm2 1eV, 200kV 1992 ESTEEM Winter Workshop 2009 2003 2007 C.T. Koch, MPI for Metals Research Transmissivity of MANDOLINE filter Cs = 1.2 mm = 200 kV E0 Slit width = 0.41 eV 83 mrad 0.41 eV slit Si [111] T0.41 eV T0.50 eV T1.00 eV T2.00 eV = (0.25··Cs·max4)2 = 2.0·103 nm2 = T0.41 eV·(0.5/0.41)2.5 = 3.3·103 nm2 = T0.41 eV·(1.0/0.41)2.5 = 18.6·103 nm2 = T0.41 eV·(2.0/0.41)2.5 = 105·103 nm2 Calculation by Uhleman & Rose (1994): T0.50 eV = 0.89·103 nm2 78 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 39 High Voltage Stabilization HV cable standard HV generator Generator tank feed-back signal Measuring tank HV measurement smart signal inverter Both high-voltage stability and filter current stability are better than 0.1 ppm ! 79 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Applications • Spectrum profiles across interfaces by EFTEM • Mapping Surface Plasmon Resonances (SPRs) by EFTEM • Momentum-resolved EELS 80 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 40 Spectrum profiles across interfaces by EFTEM 81 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Extraction of line profiles from EFTEM maps Image size: MC slit: Filter slit: Energy step: Energy: SrTiO3 (100) 1k x 1k 0.4 eV 0.4 eV 0.4 eV 0 .. 39.6 eV (100 frames) Acquisition: 40 eV -> 0eV 17 GB SrTiO3 (100) 82 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 41 EELS profiles from EFTEM Avg. profile 83 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Analysis of a single spectrum profile 84 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 42 Profiles of sample edge Average spectrum profile Edge profile at 1.2eV loss 85 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Spatial extend of STO surface plasmon 4.4 eV 5.6 eV 10 eV 86 ESTEEM Winter Workshop 2009 20 eV C.T. Koch, MPI for Metals Research 43 SrTiO3 sample edge 87 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Mapping Surface Plasmon Resonances (SPRs) by EFTEM 88 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 44 SPR mapping by spatially-resolved EELS Access to full spectral and spatial information with nm resolution. BUT, • long acquisition time (~ 15 mins) Experiment D C Simulation (Nelayah et al. Nature Physics 3, 348 - 353 (2007)) 89 C.T. Koch, MPI for Metals Research ESTEEM Winter Workshop 2009 SPR imaging by low-loss EFTEM A A ω = 1.00 eV B ω = 1.45 eV C ω = 2.00 eV A C B 1.00 eV 1.45 eV 2.00 eV B C Energy loss (eV) ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 45 EFTEM imaging of a 250 nm long nanoprism vacuum SiNx ω = 0.9 eV 91 ω = 1.5 eV ESTEEM Winter Workshop 2009 ω = 2.0 eV C.T. Koch, MPI for Metals Research Low-loss EFTEM v/s STEM-EELS ω = 0.9 eV ω = 1.5 eV ω = 2.0 eV EFTEM 452 nm E STEM-EELS Nelayah et al. Nature Physics 3, 348 - 353 (2007) For SPR´s mapping, STEM-EELS and low loss EFTEM offer comparable possibilities. BUT, with EFTEM - quick access to SPR´s map - no intensive post- acquisition data analysis - Higher spatial sampling 92 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 46 Momentum-resolved EELS 93 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research First -q maps (1973) Microscope: Hitachi HU11A, E0 = 75 keV, = 8µrad, E = 0.5 eV Spectrometer: Wien filter R. Vincent and J. Silcox, Phys. Rev. Lett. 31 (1973) 1487 94 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 47 Removing Cerenkov artifacts (a) 150 (b) Cerenkov bump 130 Counts (102)110 90 70 50 30 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 Energy loss (eV) (a) ω–q map of h-GaN at a thick region with strong Cerenkov losses; (b) lineprofiles extracted at different q values with a linewidth of about 5 µrad. The energy loss of Cerenkov radiation has a narrow angular distribution. L. Gu et al, Phys. Rev. B 75 (2007) 195214, data recorded on Zeiss Libra (StEM) 95 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research Conclusions • Electron energy loss spectroscopy with 4 meV resolution has already been possible in the 1960s (=> EELS phonon spectroscopy). • Early spectrometers could only handle small acceptance semi-angles (of order 1 mrad) • Modern energy filters will hopefully reach energy resolution of pure spectrometers, combined with high spatial and momentum resolution. 96 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 48 Future Energy Filters? K. Tsuno, Nucl. Instr Meth. Phys. Res. A 519 (2004) 286–296 97 H. Rose, Sci. Technol. Adv. Mater. 9 (2008) 014107 ESTEEM Winter Workshop 2009 C.T. Koch, MPI for Metals Research 49
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